The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 21, 2018
Filed:
Jul. 16, 2015
Sung-joo Kim, Hwaseong-si, KR;
Jin-pyoung Kim, Suwon-si, KR;
Do-hyun Seo, Hwaseong-si, KR;
Jae-pil Lee, Hwaseong-si, KR;
Hyun-hoon Lee, Hwaseong-si, KR;
Sung-jo Hwang, Anseong-si, KR;
Sung-Joo Kim, Hwaseong-si, KR;
Jin-Pyoung Kim, Suwon-si, KR;
Do-Hyun Seo, Hwaseong-si, KR;
Jae-Pil Lee, Hwaseong-si, KR;
Hyun-Hoon Lee, Hwaseong-si, KR;
Sung-Jo Hwang, Anseong-si, KR;
Abstract
Provided are an apparatus and method of sensing liquid leakage for a lithography apparatus, which can prevent a collector mirror from being contaminated by sensing leakage of cooling water supplied to the collector mirror of an extreme ultraviolet (EUV) light generating apparatus. The liquid leakage sensing apparatus includes a collector mirror module, a cooling unit configured to supply a cooling water to one surface of the collector mirror module, a gas supply unit configured to supply a water soluble gas to the cooling unit, and a sensing unit configured to sense the water soluble gas having leaked to the outside of the cooling unit.