This inventor holds 2 USPTO granted patents. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2017-2018.
Company Filing History:
Years Active: 2017-2018
Title: Do-Hyun Seo: Innovator in Extreme Ultraviolet Technology
Introduction
Do-Hyun Seo is a prominent inventor based in Hwaseong, South Korea. He has made significant contributions to the field of extreme ultraviolet (EUV) technology, particularly in the development of apparatuses that enhance lithography processes. With a total of 2 patents to his name, Seo continues to push the boundaries of innovation in his field.
Latest Patents
Seo's latest patents include an "Apparatus and method of sensing liquid leakage for lithography apparatus." This invention aims to prevent contamination of the collector mirror by detecting leakage of cooling water supplied to the collector mirror of an EUV light generating apparatus. The liquid leakage sensing apparatus comprises a collector mirror module, a cooling unit, a gas supply unit, and a sensing unit that detects any water-soluble gas that has leaked outside the cooling unit.
Another notable patent is the "Apparatus for generating extreme ultraviolet light." This apparatus features a droplet generator that provides droplets to react with light from a light source, thereby generating extreme ultraviolet light. It also includes a droplet collector and a droplet detector equipped with multiple pressure sensors to monitor the position of the droplets.
Career Highlights
Do-Hyun Seo is currently employed at Samsung Electronics Co., Ltd., where he applies his expertise in developing cutting-edge technologies. His work has been instrumental in advancing the capabilities of EUV lithography, which is crucial for the semiconductor manufacturing industry.
Collaborations
Seo collaborates with talented colleagues, including Sung-Jo Hwang and Jae-Pil Lee. Together, they contribute to innovative projects that aim to enhance the efficiency and effectiveness of lithography processes.
Conclusion
Do-Hyun Seo is a key figure in the realm of extreme ultraviolet technology, with a focus on improving lithography apparatuses. His patents reflect his commitment to innovation and excellence in the field.