Samsung Electronics Co., Ltd.

Jae-Pil Lee

Sung-Joo Kim

Sung-Jo Hwang

Do-Hyun Seo

Jin-seok Heo

Jin-Pyoung Kim

Hyun-Hoon Lee

Da-Hae Lee

Provided are an apparatus and method of sensing liquid leakage for a lithography apparatus, which can prevent a collector mirror from being contaminated by sensing leakage of cooling water supplied to the collector mirror of an extreme ultraviolet (EUV) light generating apparatus. The liquid leakage sensing apparatus includes a collector mirror module, a cooling unit configured to supply a cooling water to one surface of the collector mirror module, a gas supply unit configured to supply a water soluble gas to the cooling unit, and a sensing unit configured to sense the water soluble gas having leaked to the outside of the cooling unit.

Apparatus and method of sensing liquid leakage for lithography apparatus

An apparatus for generating extreme ultraviolet light includes a droplet generator which provides a droplet to react with light from a light source to generate extreme ultraviolet light, a droplet collector which collects the droplet, and a droplet detector which includes a plurality of pressure sensors, the pressure sensors detect a position of the droplet provided to the droplet collecting unit.

Apparatus for generating extreme ultraviolet light

Growing community of inventors

Hwaseong-si, South Korea

Jae-Pil Lee