Jae-Hyoung Koo

Title: Jae-Hyoung Koo: Innovator in Semiconductor Technology

Introduction

Jae-Hyoung Koo is a prominent inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His innovative methods have advanced the fabrication processes in the semiconductor industry.

Latest Patents

One of Jae-Hyoung Koo's latest patents is a method for fabricating a capacitor with a high aspect ratio. This method involves forming a first silicon layer over a semiconductor substrate, where the first silicon layer is doped with a dopant. It also includes forming an undoped second silicon layer over the first silicon layer, etching to create an opening, forming a storage node in the opening, and subsequently removing both silicon layers. Another notable patent is a method for forming a device isolation layer of a semiconductor device or a non-volatile memory device. This method entails forming trenches of a predetermined depth by etching a substrate, creating a first insulation layer inside the trenches, and applying a liner oxide layer on the internal walls, followed by forming a second insulation layer for device isolation.

Career Highlights

Jae-Hyoung Koo has worked with leading companies in the semiconductor industry, including Hynix Semiconductor Inc. and SK Hynix Inc. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in semiconductor technology.

Collaborations

Throughout his career, Jae-Hyoung Koo has collaborated with talented individuals such as Jin-Woong Kim and Mi-Ri Lee. These collaborations have fostered an environment of innovation and creativity, leading to the development of new technologies.

Conclusion

Jae-Hyoung Koo is a distinguished inventor whose work in semiconductor technology has led to significant advancements in the field. His patents reflect his commitment to innovation and his contributions continue to influence the industry.