Jae-Hwan Sim

Title: Innovations of Jae-Hwan Sim in Photoresist Technology

Introduction

Jae-Hwan Sim is a notable inventor based in Cheonan-si, South Korea. He has made significant contributions to the field of photoresist technology, holding two patents that showcase his innovative approach to enhancing etch rates and developing advanced coating compositions.

Latest Patents

One of Jae-Hwan Sim's latest patents is focused on underlying coating compositions for use with photoresists. This invention provides new compositions and methods that include antireflective compositions capable of exhibiting enhanced etch rates in standard plasma etchants. The preferred antireflective coating compositions of this invention have decreased carbon content compared to prior compositions. Another significant patent involves a method for forming patterns using an antireflective coating composition that includes a photoacid generator. This composition consists of a polymer, a photoacid generator with a crosslinkable group, a compound that can crosslink the polymer and the photoacid generator, a thermal acid generator, and an organic solvent.

Career Highlights

Jae-Hwan Sim has worked with prominent companies in the electronic materials sector, including Rohm and Haas Electronic Materials Korea Ltd. and Rohm & Haas Electronic Materials LLC. His work in these organizations has allowed him to develop and refine his innovative ideas in the field of photoresist technology.

Collaborations

Throughout his career, Jae-Hwan Sim has collaborated with talented individuals, including Jung-June Lee and Jae-Yun Ahn, who is a woman. These collaborations have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Jae-Hwan Sim's contributions to photoresist technology through his innovative patents highlight his expertise and commitment to advancing the field. His work continues to influence the industry and pave the way for future innovations.