The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 15, 2022
Filed:
Oct. 31, 2017
Applicant:
Rohm and Haas Electronic Materials Korea Ltd., Chungcheongnam-Do, KR;
Inventors:
Jung-June Lee, Gyeonggi-do, KR;
Jae-Yun Ahn, Gyeonggi-do, KR;
You-Rim Shin, Gyeonggi-do, KR;
Jin-Hong Park, Gyeonggi-do, KR;
Jae-Hwan Sim, Seongnam-Gyeonggi-do, KR;
Assignee:
ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD., Chungcheongnam-Do, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/09 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/26 (2006.01); G03F 7/039 (2006.01); C09D 5/00 (2006.01); C08G 73/06 (2006.01); C09D 179/04 (2006.01);
U.S. Cl.
CPC ...
G03F 7/091 (2013.01); C08G 73/0655 (2013.01); C09D 5/006 (2013.01); C09D 179/04 (2013.01); G03F 7/0392 (2013.01); G03F 7/094 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2004 (2013.01); G03F 7/26 (2013.01);
Abstract
New composition and methods are provided that include antireflective compositions that can exhibit enhanced etch rates in standard plasma etchants. Preferred antireflective coating compositions of the invention have decreased carbon content relative to prior compositions.