Company Filing History:

9 out of 131,214

Samsung Electronics Co., Ltd.

patents

1 out of 658

Postech Academy-industry Foundation

patents

1 out of 7,574

Samsung Electro-mechanics Co., Ltd.

patents

where one patent can have more than one assignee

Years Active: 2008-2022

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9 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 11474426 - Photomask for negative-tone development (2022-10-18),

2. 11327395 - Semiconductor device (2022-05-10),

3. 10644006 - Micro-pattern forming method, capacitor and method of manufacturing the same, semiconductor device and method of manufacturing the same, and electronic system including semiconductor device (2020-05-05),

4. 10620528 - Method of fabricating phase shift mask and method of fabricating semiconductor device (2020-04-14),

5. 10600789 - Micro-pattern forming method, capacitor and method of manufacturing the same, semiconductor device and method of manufacturing the same, and electronic system including semiconductor device (2020-03-24),

6. 10204912 - Micro-pattern forming method, capacitor and method of manufacturing the same, semiconductor device and method of manufacturing the same, and electronic system including semiconductor device (2019-02-12),

7. 9659940 - Semiconductor device and method of manufacturing the same (2017-05-23),

8. 7843288 - Apparatus and system for transmitting power wirelessly (2010-11-30),

9. 7468708 - Mobile terminal and mobile terminal antenna for reducing electromagnetic waves radiated towards human body (2008-12-23),

Title: Inventor Jae-hee Kim: Pioneering Innovations in Photomask Technology

Introduction

Jae-hee Kim, a notable inventor located in Yongin-si, South Korea, has made significant contributions to the field of semiconductor technology, boasting an impressive portfolio of 9 patents. His work primarily focuses on innovative photomask designs, which play a crucial role in the manufacturing of semiconductor devices.

Latest Patents

Among his latest patents, Kim has developed a "Photomask for Negative-Tone Development". This innovative photomask features a main region surrounded by a scribe lane region containing two lanes. These lanes strategically include dummy patterns designed to effectively radiate light exceeding a threshold to a specific portion of a negative-tone photoresist. This design enhances the efficacy of the photomask in semiconductor applications.

Another significant patent of Kim’s is related to a "Semiconductor Device"—an advanced method for fabricating a phase shift mask. In this patent, a transmissive substrate is prepared where distinct mask regions are defined. This technology enables the creation of main patterns with precise dimensions and configurations, which are essential for the functionality of modern semiconductor devices.

Career Highlights

Kim's career has been distinguished by his tenure at leading technology institutions. He has notably worked with Samsung Electronics Co., Ltd., a global leader in semiconductor manufacturing. Additionally, he was associated with the Postech Academy-Industry Foundation, where he collaborated on various innovative projects that furthered semiconductor research and development.

Collaborations

Throughout his career, Jae-hee Kim has collaborated with esteemed colleagues in the industry, including Chan Soo Hwang and Soon-mok Ha. These collaborations have facilitated the exchange of ideas and expertise, driving innovation in the realm of photomask technology and semiconductor fabrication.

Conclusion

Jae-hee Kim stands out as a prominent figure in the semiconductor field, with his inventive approaches exemplified through his numerous patents. His contributions not only enhance the efficiency of semiconductor device manufacturing but also pave the way for future advancements in the industry. As technology continues to evolve, Kim's innovative spirit remains a driving force for cutting-edge developments in photomask technology.

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