Company Filing History:
2 out of 60 
2 out of 15 Years Active: 2008
Title: Jae Gun Park: Innovator in Polishing Slurry Technology
Introduction
Jae Gun Park is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of chemical mechanical polishing (CMP) through his innovative patents. With a total of two patents to his name, Park has focused on developing advanced polishing slurries that enhance semiconductor manufacturing processes.
Latest Patents
Park's latest patents include a polishing slurry and a method of producing the same. The first patent discloses a polishing slurry that comprises polishing particles with a specific particle size distribution, which is crucial for producing semiconductors with fine design rules. The invention ensures an optimum polishing particle size, allowing for a desirable CMP removal rate while minimizing scratches. The second patent focuses on a polishing slurry that exhibits high selectivity in polishing speeds between oxide and nitride layers, essential for producing ultra-highly integrated semiconductors with design rules of 0.13 micrometers or less.
Career Highlights
Throughout his career, Jae Gun Park has worked with various companies, including K.C. Tech Co., Ltd. and Iucf-hyu. His experience in these organizations has allowed him to refine his expertise in polishing slurry technology and semiconductor manufacturing processes.
Collaborations
Park has collaborated with notable coworkers such as Seok Min Hong and Jae Hyun Jeon. These collaborations have contributed to the advancement of his research and the successful development of his patented technologies.
Conclusion
Jae Gun Park is a distinguished inventor whose work in polishing slurry technology has significantly impacted the semiconductor industry. His innovative patents demonstrate his commitment to enhancing manufacturing processes and improving product quality.