Company Filing History:
Years Active: 2004-2008
Title: Jacobus Burghoom: Innovating with Precision in Lithography
Introduction:
Jacobus Burghoom, a talented inventor based in Haelen, Netherlands, has made significant contributions to the field of lithography. With a keen eye for detail and a passion for precision, he has successfully patented two groundbreaking innovations in lithographic apparatus and device manufacturing methods.
Latest Patents:
1. Lithographic apparatus and device manufacturing method: Jacobus' invention revolutionizes the alignment process during substrate exposure, allowing for the optimization of exposure conditions by inspecting alignment marks on the substrate in real-time.
2. Abbe arm calibration system for use in lithographic apparatus: This patent introduces a novel calibration system for lithographic apparatus, using a reference grating to determine lateral shifts in the wafer table, ultimately enabling precise calibration of the Abbe arm.
Career Highlights:
Jacobus Burghoom is a valued member of the renowned company ASML Netherlands B.V., a leader in the semiconductor industry. His innovative spirit and dedication to perfection have made a significant impact on the company's technological advancements in lithography.
Collaborations:
Throughout his career, Jacobus has collaborated closely with talented individuals such as Richard Alexander George and Cheng-Qun Gui. Together, they have combined their expertise to push the boundaries of innovation in lithographic technology.
Conclusion:
In conclusion, Jacobus Burghoom's inventive prowess and meticulous approach to lithography have cemented his reputation as a trailblazer in the field. His patents not only showcase his technical acumen but also affirm his commitment to driving progress in the semiconductor industry. Jacobus' contributions continue to inspire fellow inventors and shape the future of lithographic technology.