The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 04, 2004
Filed:
Jan. 12, 2001
Applicant:
Inventors:
Rogier H. M. Groeneveld, Eindhoven, NL;
Erik R. Loopstra, Heeze, NL;
Jacobus Burghoom, Haelen, NL;
Leon M. Levasier, Hedel, NL;
Alexander Straaijer, Eindhoven, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 2/752 ; G03B 2/742 ; G01B 1/100 ; G06K 7/015 ;
U.S. Cl.
CPC ...
G03B 2/752 ; G03B 2/742 ; G01B 1/100 ; G06K 7/015 ;
Abstract
In a lithographic apparatus, a reference grating mounted on the wafer table WT is illuminated with a measurement beam incident in a direction independent of wafer table tilt. The diffraction orders are detected by detector and used to determine the lateral shift in the wafer table resulting from a non-zero Abbe arm, and hence the Abbe arm, for calibration purposes. The detector may be a detector also used for off-axis alignment of the wafer and wafer table.