Asml Netherlands B.v.

Jacobus Burghoom

Erik Roelof Loopstra

Alexander Straaijer

Pieter Willem Herman De Jager

Cheng-Qun Gui

Leon Martin Levasier

Robbert Edgar Van Leeuwen

Richard Alexander George

Rogier H M Groeneveld

A lithographic apparatus in which alignment marks on the substrate are inspected during the exposure of the substrate to optimize the exposure conditions.

Lithographic apparatus and device manufacturing method

In a lithographic apparatus, a reference grating mounted on the wafer table WT is illuminated with a measurement beam incident in a direction independent of wafer table tilt. The diffraction orders are detected by detector and used to determine the lateral shift in the wafer table resulting from a non-zero Abbe arm, and hence the Abbe arm, for calibration purposes. The detector may be a detector also used for off-axis alignment of the wafer and wafer table.

Abbe arm calibration system for use in lithographic apparatus

Growing community of inventors

Haelen, Netherlands

Jacobus Burghoom