Rehovot, Israel

Jacob Ofek

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Nova Corporation. Active years: 2026.

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Jacob Ofek: Innovator in Semiconductor Metrology

Introduction

Jacob Ofek is a prominent inventor based in Rehovot, Israel. He has made significant contributions to the field of semiconductor device metrology. His innovative work focuses on enhancing the accuracy and efficiency of measurements in semiconductor technology.

Latest Patents

Jacob Ofek holds a patent for "Time-domain optical metrology and inspection of semiconductor devices." This patent involves creating a time-domain representation of wavelength-domain measurement data of light reflected by a patterned structure of a semiconductor device. The process includes selecting relevant and irrelevant portions of the time-domain representation and determining measurements of parameters of interest through model-based processing.

Career Highlights

Jacob Ofek is associated with Nova Corporation, where he applies his expertise in semiconductor technology. His work has been instrumental in advancing the methodologies used in the inspection and metrology of semiconductor devices.

Collaborations

Jacob collaborates with notable colleagues, including Gilad Barak and Amir Sagiv. Their combined efforts contribute to the innovative projects at Nova Corporation.

Conclusion

Jacob Ofek's contributions to semiconductor metrology exemplify the importance of innovation in technology. His patent and collaborative work continue to influence the field significantly.

Profile summary based on public USPTO records.
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