This inventor holds 2 USPTO granted patents and 2 published patent applications. Top assignees: E/g Electro-Graph, Inc., Plansee USA LLC. Active years: 2023-2025.
Company Filing History:
Years Active: 2023-2025
Title: Jacob Boyer: Innovator in Ion Implantation Technology
Introduction
Jacob Boyer is a notable inventor based in Vista, California. He has made significant contributions to the field of ion implantation technology, holding a total of 2 patents. His work focuses on enhancing the efficiency and functionality of ion implanters, which are crucial in semiconductor manufacturing.
Latest Patents
Jacob Boyer's latest patents include innovative designs that improve the performance of ion implanters. One of his patents is for a repeller assembly designed for mounting into an arc chamber of an ion implanter. This repeller assembly features a knob-shaped body positioned opposite to a cathode assembly, along with a tubular insert and insulators that ensure optimal functionality. Another patent involves a cathode holding assembly that is mounted on an arc chamber support, which includes a cathode holding plate, an insulator block, and a shield cap. These inventions reflect his commitment to advancing ion implantation technology.
Career Highlights
Throughout his career, Jacob Boyer has worked with several companies, including Plansee USA LLC and E/G Electro-Graph, Inc. His experience in these organizations has allowed him to develop and refine his innovative ideas in the field of ion implantation.
Collaborations
Jacob has collaborated with talented individuals such as Nam Ngo and Gerhard Duerrhammer. These partnerships have contributed to the successful development of his patented technologies.
Conclusion
Jacob Boyer is a distinguished inventor whose work in ion implantation technology has led to significant advancements in the field. His patents demonstrate his innovative spirit and dedication to improving semiconductor manufacturing processes.