Jacky Kuo

Title: Innovations by Jacky Kuo

Introduction

Jacky Kuo is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of manufacturing methods for advanced materials.

Latest Patents

Jacky Kuo holds two patents that showcase his innovative approach. The first patent is a manufacturing method for a thin film with an anti-reflection rough surface. This method involves forming a thin film over a substrate, followed by the deposition of an amorphous silicon layer. Through a series of annealing procedures, the amorphous silicon is transformed into a polysilicon layer with an anti-reflection rough surface. The second patent details a method to grow self-aligned silicon on a poly-gate, source, and drain. This process includes forming a MOS on a semiconductor substrate and utilizing a silicon-rich metal silicide layer to create a silicon layer on top of the gate and source/drain.

Career Highlights

Throughout his career, Jacky Kuo has worked with prominent companies such as United Semiconductor Circuit Corporation and United Semiconductor Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in semiconductor technology.

Collaborations

Jacky has collaborated with talented individuals in his field, including Shu-Jen Chen and Jiunn-Hsien Lin. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Jacky Kuo's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the industry. His innovative methods continue to pave the way for advancements in material science and semiconductor manufacturing.