Jack Yaung

Title: Jack Yaung - Innovator in Integrated Circuit Structures

Jack Yaung is an accomplished inventor based in Portland, OR (US). He has made significant contributions to the field of semiconductor technology, particularly in the area of integrated circuit structures. His innovative work has led to the development of a unique patent that enhances the performance and efficiency of semiconductor devices.

Latest Patents

Jack Yaung holds a patent titled "Fin doping and integrated circuit structures resulting therefrom." This patent describes a novel approach to integrated circuit structures that includes a semiconductor fin. The design features a lower portion of the semiconductor fin that contains both N-type and P-type dopants, with a net excess of P-type dopants of at least 2E18 atoms/cm. Additionally, a gate stack is positioned over and conforms to the upper portion of the semiconductor fin, with source or drain regions located on either side of the gate stack.

Career Highlights

Jack Yaung is currently employed at Intel Corporation, a leading company in semiconductor manufacturing. His work at Intel has allowed him to push the boundaries of technology and contribute to advancements in integrated circuits. With one patent to his name, he has established himself as a key player in the field of semiconductor innovation.

Collaborations

Jack has collaborated with notable colleagues, including Aaron D Lilak and Cory E Weber. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

In summary, Jack Yaung is a prominent inventor whose work in integrated circuit structures has the potential to revolutionize semiconductor technology. His contributions at Intel Corporation and his innovative patent demonstrate his commitment to advancing the field.