This inventor holds 1 USPTO granted patent. Top assignee: Auros Technology, Inc.. Active years: 2023.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2023
Title: Jack Woo: Innovator in Semiconductor Technology
Introduction
Jack Woo is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent work. His expertise and dedication to advancing technology have positioned him as a key figure in his industry.
Latest Patents
Jack Woo holds a patent for an overlay mark, overlay measurement method, and semiconductor device manufacturing method using the overlay mark. This patent provides an overlay mark designed to determine relative misalignment between two or more pattern layers or between two or more patterns formed within a single pattern layer. The overlay mark includes a first overlay mark positioned at the center, a second overlay mark positioned above and below the first overlay mark or on the left and right of it, and a third and fourth overlay mark each positioned diagonally with the first overlay mark in between. This innovation is crucial for enhancing the precision of semiconductor manufacturing processes.
Career Highlights
Jack Woo is currently employed at Auros Technology, Inc., where he continues to develop cutting-edge technologies in the semiconductor sector. His work has been instrumental in improving manufacturing techniques and ensuring higher quality in semiconductor devices.
Collaborations
Jack collaborates with talented professionals in his field, including Sung Hoon Hong and Hyun Jin Chang. Their combined expertise fosters a creative environment that drives innovation and technological advancement.
Conclusion
Jack Woo's contributions to semiconductor technology through his patent and collaborative efforts highlight his role as an influential inventor. His work continues to shape the future of the industry, making significant strides in manufacturing precision and efficiency.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile