The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 14, 2023

Filed:

Jul. 26, 2022
Applicant:

Auros Technology, Inc., Hwaseong-si, KR;

Inventors:

Sung Hoon Hong, Incheon, KR;

Hyun Jin Chang, Seoul, KR;

Hyun Chui Lee, Hwaseong-si, KR;

Jack Woo, Seoul, KR;

Assignee:

AUROS TECHNOLOGY, INC., Hwaseong-si, KR;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/027 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70633 (2013.01);
Abstract

Provided are an overlay mark, and an overlay measurement method and a semiconductor device manufacturing method using the overlay mark. Specifically, provided is an overlay mark for determining relative misalignment between two or more pattern layers or between two or more patterns separately formed in one pattern layer, the overlay mark including a first overlay mark positioned in the center, a second overlay mark positioned above and below the first overlay mark or on the left and right thereof, and a third overlay mark and a fourth overlay mark each positioned in a diagonal line with the first overlay mark in between.


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Quick Actions:

Hong, Sung. (2023). Overlay mark, overlay measurement method and semiconductor device manufacturing method using the overlay mark (U.S. Patent No. 11604421). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11604421

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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