Los Gatos, CA, United States of America

Jack S Kasahara

This inventor holds 3 USPTO granted patents. Top assignee: Fsi International, Inc.. Active years: 2001-2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jack S Kasahara. Retrieved from https://idiyas.com/inventor/jack-s-kasahara

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 33.3

Average Co-Inventor Count = 5.0

ph-index = 3

Forward Citations = 59(Granted Patents)


Company Filing History:


Years Active: 2001-2005

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3 patents (USPTO):Explore Patents

Title: Jack S. Kasahara: Innovator in Thermal Processing Technologies

Introduction

Jack S. Kasahara is a notable inventor based in Los Gatos, CA (US). He has made significant contributions to the field of microelectronics through his innovative thermal processing systems. With a total of 3 patents, his work focuses on enhancing the manufacturing processes of low-k dielectric films.

Latest Patents

Kasahara's latest patents include groundbreaking technologies that improve the efficiency and effectiveness of microelectronic device fabrication. One of his notable inventions is a thermal processing system and methods for forming low-k dielectric films suitable for incorporation into microelectronic devices. This invention features single wafer processing methods and systems that allow for the manufacturing of films with low-k properties and low indices of refraction. The methods incorporate a processing station where both curing and post-cure, in situ gas cooling occur.

Another significant patent is a thermal processing chamber designed for heating and cooling wafer-like objects. This chamber includes a double-walled shell, a pedestal-style heater, and internal passages for the transport of cooling gases and removal of exhaust gases. The design allows for in situ cooling of wafer-like objects and provides means for precise optimization of cooling. The methods enable the processing of wafer-like objects in a controlled environment, ensuring the desired material properties are achieved.

Career Highlights

Jack S. Kasahara has been instrumental in advancing thermal processing technologies during his career. He works at FSI International, Inc., where he continues to innovate and develop new solutions for the microelectronics industry. His expertise in thermal processing has positioned him as a key figure in this specialized field.

Collaborations

Throughout his career, Kasahara has collaborated with talented individuals such as Jeffrey D. Womack and Vuong P. Nguyen. These collaborations have contributed to the development of advanced technologies and have fostered a spirit of innovation within the industry.

Conclusion

Jack S. Kasahara is a distinguished inventor whose work in thermal processing technologies has significantly impacted the microelectronics field. His innovative patents and contributions continue to shape the future of manufacturing processes in this industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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