The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 04, 2005
Filed:
Jul. 11, 2001
Applicants:
Devendra Kumar, Los Altos, CA (US);
Jeffrey D. Womack, Lake Oswego, OR (US);
Vuong P. Nguyen, Allen, TX (US);
Jack S. Kasahara, Los Gatos, CA (US);
Sokol Ibrani, Pleasanton, CA (US);
Inventors:
Devendra Kumar, Los Altos, CA (US);
Jeffrey D. Womack, Lake Oswego, OR (US);
Vuong P. Nguyen, Allen, TX (US);
Jack S. Kasahara, Los Gatos, CA (US);
Sokol Ibrani, Pleasanton, CA (US);
Assignee:
FSI International, Inc., Chaska, MN (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 512 ; B05D 302 ;
U.S. Cl.
CPC ...
Abstract
Single wafer processing methods and systems for manufacturing films having low-k properties and low indices of refraction. The methods incorporate a processing station in which both curing and post-cure, in situ gas cooling take place.