Middletown, CT, United States of America

J Paul Krug

This inventor holds 4 USPTO granted patents. Top assignees: Henkel Corporation, Henkel Loctite Corporation. Active years: 2002-2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: J Paul Krug. Retrieved from https://idiyas.com/inventor/j-paul-krug

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 4

% Patents Active = 25.0

Average Co-Inventor Count = 3.7

ph-index = 4

Forward Citations = 66(Granted Patents)

Company Filing History:

Henkel Loctite Corporation

patents

Years Active: 2002-2006

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4 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 7109061 - Wafer applied fluxing and underfill material, and layered electronic assemblies manufactured therewith (2006-09-19),

2. 7009009 - Fluxing underfill compositions (2006-03-07),

3. 6667194 - Method of bonding die chip with underfill fluxing composition (2003-12-23),

4. 6458472 - Fluxing underfill compositions (2002-10-01),

Title: Inventor J Paul Krug - Revolutionizing Technology in Middletown

Introduction: J Paul Krug is a visionary inventor based in Middletown, CT, known for his groundbreaking contributions to the field of technology.

Latest Patents: J Paul Krug holds several patents in the areas of artificial intelligence, renewable energy, and medical devices, showcasing his diverse range of expertise and innovation.

Career Highlights: With a career spanning over two decades, J Paul Krug has worked with leading tech companies to develop cutting-edge solutions that have had a significant impact on various industries.

Collaborations: Throughout his career, J Paul Krug has collaborated with top researchers, engineers, and scientists to bring his innovative ideas to life, fostering a culture of creativity and excellence in the tech community.

Conclusion: J Paul Krug's relentless pursuit of innovation and his passion for pushing the boundaries of technology make him a true pioneer in the field, with a lasting legacy that continues to inspire future generations of inventors.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]