Company Filing History:

10 out of 38,068

Micron Technology Incorporated

patents

1 out of 156

Micron Semiconductor, Inc.

patents

Years Active: 1994-2007

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11 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 7192829 - Methods of forming floating gate transistors (2007-03-20),

2. 7057285 - Aluminum interconnects with metal silicide diffusion barriers (2006-06-06),

3. 6791141 - Semiconductor constructions comprising stacks with floating gates therein (2004-09-14),

4. 6787428 - Aluminum-filled self-aligned trench for stacked capacitor structure and methods (2004-09-07),

5. 6720605 - Aluminum-filled self-aligned trench for stacked capacitor structure and methods (2004-04-13),

6. 6465319 - Aluminum-filled self-aligned trench for stacked capacitor structure and methods (2002-10-15),

7. 6165863 - Aluminum-filled self-aligned trench for stacked capacitor structure and (2000-12-26),

8. 5985719 - Method of forming a programmable non-volatile memory cell (1999-11-16),

9. 5726471 - Programmable non-volatile memory cell and method of forming a (1998-03-10),

10. 5707898 - Method of forming a programmable non-volatile memory cell by providing a (1998-01-13),

11. 5292681 - Method of processing a semiconductor wafer to form an array of (1994-03-08),

Title: J Dennis Keller: Innovator in Semiconductor Technology

Introduction

J Dennis Keller is a prominent inventor based in Boise, ID, known for his significant contributions to semiconductor technology. With a total of 11 patents to his name, Keller has made remarkable advancements in the field, particularly in the design and fabrication of floating gate transistors and aluminum interconnects.

Latest Patents

Keller's latest patents include innovative methods for forming floating gate transistors. These patents describe a process where a floating gate is constructed over a substrate, featuring an inner first portion and an outer second portion. The inner portion contains a higher concentration of conductivity-enhancing impurities compared to the outer portion. Additionally, one implementation involves using a first layer of conductively doped semiconductive material alongside a second layer of substantially undoped semiconductive material. Another notable patent focuses on aluminum interconnects with metal silicide diffusion barriers. This invention facilitates electrical communication between an active device region of a semiconductor substrate and a bit line extending above the substrate. The aluminum interconnect is designed within a trench and may include a metal silicide layer to form a buried metal diffusion layer, enhancing the overall performance of semiconductor devices.

Career Highlights

Throughout his career, Keller has worked with leading companies in the semiconductor industry, including Micron Technology Incorporated and Micron Semiconductor, Inc. His work has significantly impacted the development of advanced semiconductor technologies, making him a respected figure in the field.

Collaborations

Keller has collaborated with notable professionals in the industry, including Roger R Lee and Ruojia R Lee. These collaborations have contributed to the advancement of semiconductor technologies and innovations.

Conclusion

J Dennis Keller's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His work continues to shape the future of the industry, demonstrating the importance of innovation in technology.

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