Livermore, CA, United States of America

Ivin Varghese

USPTO Granted Patents = 4 

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 2013-2021

Loading Chart...
4 patents (USPTO):Explore Patents

Title: Ivin Varghese: Innovator in Substrate Dry Cleaning Technology

Introduction

Ivin Varghese is a notable inventor based in Livermore, CA (US). He has made significant contributions to the field of substrate dry cleaning technology, holding a total of 4 patents. His innovative work focuses on developing methods and apparatuses that enhance the efficiency of cleaning substrates.

Latest Patents

One of Ivin Varghese's latest patents is a contamination removal apparatus and method. This invention includes a substrate dry cleaning apparatus and a substrate dry cleaning system. The system features a substrate support and a reactive species generator. The generator consists of a first conduit that defines a flow channel extending to an outlet, which faces the substrate support. It also includes a first electrode and a second electrode, with the flow channel positioned between them. Additionally, the design incorporates inert walls to optimize the cleaning process.

Career Highlights

Throughout his career, Ivin Varghese has worked with several prominent companies, including Rave N.P., Inc. and Bruker Nano GmbH. His experience in these organizations has allowed him to refine his skills and contribute to advancements in substrate cleaning technologies.

Collaborations

Ivin has collaborated with notable professionals in his field, including Mehdi Balooch and Charles W. Bowers. These partnerships have further enriched his work and led to innovative solutions in substrate cleaning.

Conclusion

Ivin Varghese is a distinguished inventor whose work in substrate dry cleaning technology has made a significant impact. His patents and collaborations reflect his commitment to innovation and excellence in his field.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…