The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 05, 2021

Filed:

Mar. 08, 2017
Applicant:

Bruker Nano, Inc., Delray Beach, FL (US);

Inventors:

Gordon Scott Swanson, Livermore, CA (US);

Ivin Varghese, Livermore, CA (US);

Mehdi Balooch, Berkeley, CA (US);

Assignee:

Bruker Nano, Inc., Delray Beach, FL (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); B08B 7/04 (2006.01); B08B 7/00 (2006.01); H01J 37/32 (2006.01); H01L 21/67 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
B08B 7/04 (2013.01); B08B 7/0021 (2013.01); B08B 7/0035 (2013.01); B08B 7/0092 (2013.01); H01J 37/3244 (2013.01); H01J 37/32082 (2013.01); H01J 37/32091 (2013.01); H01J 37/32449 (2013.01); H01L 21/02057 (2013.01); H01L 21/67028 (2013.01); H01J 2237/006 (2013.01); H01J 2237/334 (2013.01); H01J 2237/335 (2013.01);
Abstract

A substrate dry cleaning apparatus, a substrate dry cleaning system, and a method of cleaning a substrate are disclosed. The substrate dry cleaning system includes a substrate support and a reactive species generator. The reactive species generator includes a first conduit defining a first flow channel that extends to an outlet of the first conduit, the outlet of the first conduit facing the substrate support, a first electrode, a second electrode facing the first electrode, the first flow channel disposed between the first electrode and the second electrode, a first inert wall disposed between the first electrode and the first flow channel, and a second inert wall disposed between the second electrode and the first flow channel.


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