Ivelin A Angelov

Title: Ivelin A. Angelov: Innovator in Substrate Processing Technologies

Introduction

Ivelin A. Angelov is a distinguished inventor based in Sunnyvale, California, with a strong portfolio that boasts 17 patents. His innovative contributions to substrate processing technologies have significantly advanced the fields of semiconductor fabrication and FinFET device manufacturing.

Latest Patents

Among his latest patents, Ivelin has developed groundbreaking technologies such as an "Ultrahigh selective nitride etch to form FinFET devices." This substrate processing system is designed to selectively etch a layer on a substrate, featuring an intricate chamber design and a precisely controlled gas distribution mechanism. The system allows for the efficient etching of materials with a high degree of finesse and accuracy.

Another significant patent he holds is for the "Variable depth edge ring for etch uniformity control." This method enhances the substrate support operation by calculating a desired pocket depth based on various process parameters. It allows for fine adjustments to be made, ensuring uniform etching and improved performance in semiconductor processes.

Career Highlights

Ivelin has had an impactful career, working with leading companies in the semiconductor industry, including Lam Research Corporation and Novellus Systems Incorporated. His tenure at these organizations has equipped him with practical insights that enrich his inventiveness and innovation in substrate processing techniques.

Collaborations

Collaboration has played a vital role in Ivelin’s career, working alongside notable colleagues such as James Eugene Caron and Joon Hong Park. These partnerships have facilitated a dynamic exchange of ideas and expertise, propelling their joint efforts forward in the quest for cutting-edge technologies.

Conclusion

Ivelin A. Angelov epitomizes the spirit of innovation within the substrate processing domain. With a robust patent portfolio and collaborations with industry leaders, he continues to make strides in enhancing semiconductor fabrication processes. His contributions are vital to advancing technology in an increasingly competitive landscape.