Ivan Petrov Ganachev

Title: Innovations of Ivan Petrov Ganachev

Introduction

Ivan Petrov Ganachev is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of technology, particularly in the development of advanced film forming and substrate treatment devices. With a total of 4 patents to his name, Ganachev's work reflects his expertise and innovative spirit.

Latest Patents

Ganachev's latest patents include a film forming apparatus designed to enhance the efficiency of plasma processing on workpieces. This apparatus features a rotary table within a chamber, a processing unit for plasma processing, and a unique exhaust system that prevents reaction gas circulation. Another significant patent is for a substrate treatment device that incorporates a placement portion for rotating substrates, a liquid supply portion, and a cooling mechanism. This device is capable of bringing liquid to a supercooled state, allowing for innovative substrate treatment methods.

Career Highlights

Throughout his career, Ganachev has worked with prominent companies such as Shibaura Mechatronics Corporation and Toshiba Corporation. His experience in these organizations has contributed to his development of cutting-edge technologies and patents.

Collaborations

Ganachev has collaborated with talented individuals in his field, including Masaya Kamiya and Kensuke Demura. These partnerships have fostered innovation and the exchange of ideas, further enhancing his contributions to technology.

Conclusion

Ivan Petrov Ganachev is a distinguished inventor whose work in film forming and substrate treatment technologies has made a significant impact. His patents and collaborations reflect his commitment to advancing technology and innovation.