The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 04, 2020

Filed:

Aug. 08, 2017
Applicant:

Shibaura Mechatronics Corporation, Yokohama-shi, Kanagawa-ken, JP;

Inventors:

Masaya Kamiya, Kanagawa, JP;

Kensuke Demura, Kanagawa, JP;

Daisuke Matsushima, Kanagawa, JP;

Haruka Nakano, Kanagawa, JP;

Ivan Petrov Ganachev, Kanagawa, JP;

Assignee:

SHIBAURA MECHATRONICS CORPORATION, Yokohama-Shi, Kanagawa-Ken, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 21/66 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01); B08B 3/10 (2006.01); B08B 7/00 (2006.01); G03F 7/40 (2006.01); G03F 7/42 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02052 (2013.01); B08B 3/10 (2013.01); B08B 7/0092 (2013.01); G03F 7/40 (2013.01); G03F 7/422 (2013.01); H01L 21/02057 (2013.01); H01L 21/67051 (2013.01); H01L 21/67109 (2013.01); H01L 21/67248 (2013.01); H01L 21/67253 (2013.01); H01L 21/68764 (2013.01); H01L 22/12 (2013.01);
Abstract

A substrate treatment device according to an embodiment includes a placement portion on which a substrate is placed and rotated, a liquid supply portion which supplies a liquid to a surface on an opposite side to the placement portion of the substrate, a cooling portion which supplies a cooling gas to a surface on a side of the placement portion of the substrate, and a control portion which controls at least one of a rotation speed of the substrate, a supply amount of the liquid, and a flow rate of the cooling gas. The control portion brings the liquid present on a surface of the substrate into a supercooled state and causes at least a part of the liquid brought into the supercooled state to freeze.


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