This inventor holds 3 USPTO granted patents and 1 EPO patent. Top assignee: Macdermid Enthone Gmbh. Active years: 2019-2025.
Company Filing History:
Years Active: 2019-2025
Title: Inventor Spotlight: Ivan Li of Waterbury, CT
Introduction
Ivan Li, an innovative inventor based in Waterbury, Connecticut, has made significant contributions to the field of microelectronics. With a total of two patents to his name, he has developed advanced compositions for copper deposition, which play a critical role in the manufacturing processes of modern electronic devices.
Latest Patents
Ivan Li's latest patents focus on aqueous electrolytic compositions designed for the electrodeposition of copper on dielectric or semiconductor base structures. The patented process involves two key steps: first, contacting a metalizing substrate, which has a conductive layer, with an aqueous electrolytic deposition composition; and second, supplying electrical current to the composition to deposit copper on the substrate. The unique formulation of the aqueous electrolytic composition includes copper ions, an acid, a suppressor, and a quaternized poly(epihalohydrin) that comprises n repeating units corresponding to structure 1N and p repeating units corresponding to structure 1P.
Career Highlights
Ivan is currently employed at Macdermid Enthone GmbH, where he utilizes his expertise to advance the company's mission in the microelectronics sector. His work has been instrumental in enhancing the efficiency and effectiveness of copper deposition processes, making significant strides towards improving microelectronics manufacturing.
Collaborations
Throughout his career, Ivan has had the opportunity to collaborate with talented individuals such as Vincent Paneccasio and Kyle M Whitten. These partnerships have not only allowed for the sharing of ideas and insights but have also propelled innovative developments within their field.
Conclusion
As an accomplished inventor, Ivan Li continues to push the boundaries of technology in microelectronics. His patents not only reflect his deep understanding of the complexities involved in copper deposition but also showcase his dedication to innovation. Ivan’s contributions are likely to influence the future of microelectronics and inspire the next generation of inventors.