This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Tokyo Electron Limited. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Issei Takeyasu - Innovator in Film Forming Methods
Introduction
Issei Takeyasu is an inventor based in Nirasaki, Japan. He has made significant contributions to the field of film forming methods, particularly in substrate processing systems. Although he currently holds no granted patents, his innovative ideas are reflected in his patent applications.
Latest Patent Applications
One of his notable patent applications is titled "FILM FORMING METHOD AND SUBSTRATE PROCESSING SYSTEM." This application describes a film forming method that includes preparing a substrate with an insulating layer featuring a recess. The method involves removing a tungsten oxide film formed by oxidizing a tungsten layer at the bottom of the recess. This is achieved by supplying TiCl gas to the recess and subsequently embedding a ruthenium film after the tungsten oxide film is removed.
Conclusion
Issei Takeyasu's work in film forming methods showcases his innovative approach to substrate processing systems. His contributions, although not yet reflected in granted patents, highlight the potential for future advancements in this field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile