Isao Mori

Title: Isao Mori: Innovator in Plasma Processing Technology

Introduction

Isao Mori is a prominent inventor based in Chofu, Japan, known for his significant contributions to plasma processing technology. With a total of 17 patents to his name, Mori has made remarkable advancements in the field, particularly in the design and functionality of plasma processing apparatuses.

Latest Patents

One of Mori's latest inventions is a plasma processing apparatus that includes a processing chamber where a sample undergoes plasma processing. This apparatus features a first radio frequency power supply that generates plasma, a sample stage for mounting the sample, and a second radio frequency power supply that provides power to the sample stage. Additionally, it incorporates a DC power supply that applies a DC voltage, which varies according to a periodically repeated waveform. This innovative design allows for the effective removal of charged particles from a wafer surface, achieving a trench shape with high verticality while minimizing damage to films that are not intended to be etched.

Career Highlights

Throughout his career, Isao Mori has worked with notable companies such as Terumo Corporation and Hitachi High-Tech Corporation. His experience in these organizations has contributed to his expertise in developing advanced plasma processing technologies.

Collaborations

Mori has collaborated with several talented individuals in his field, including Ema Itoh and Naoki Yasui. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Isao Mori's contributions to plasma processing technology have established him as a leading inventor in his field. His innovative designs and collaborative efforts continue to influence advancements in technology.