Zama, Japan

Isamu Shimoda

This inventor holds 44 USPTO granted patents, primarily in Electron Emission Technology. Top assignee: Canon Kabushiki Kaisha. Active years: 1986-2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Isamu Shimoda. Retrieved from https://idiyas.com/inventor/isamu-shimoda

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 15

Forward Citations = 803(Granted Patents)


Location History:

  • Zama, US (1991)
  • Zama, JP (1986 - 2003)

Company Filing History:


Years Active: 1986-2003

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Areas of Expertise:
Electron Emission Device
Exposure Method
Scanning Optical Apparatus
Electron Emitting Element
Light Quantity Control
Information Processing
Reading Apparatus
X-Ray Exposure
Multi-Electron-Beam
Polycrystalline Silicon Resistor
Supply Circuit
Mask Cassette
44 patents (USPTO):Explore Patents

Title: The Innovative Journey of Inventor Isamu Shimoda

Introduction: Isamu Shimoda is a renowned inventor hailing from Zama, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Isamu Shimoda holds several patents in the areas of robotics, artificial intelligence, and sustainable energy solutions, showcasing his commitment to pushing the boundaries of technological advancement.

Career Highlights: With a career spanning over two decades, Isamu Shimoda has worked with leading tech companies in Japan, spearheading research and development projects that have led to significant technological breakthroughs.

Collaborations: Throughout his career, Isamu Shimoda has collaborated with top researchers, engineers, and scientists both locally and internationally, fostering a culture of innovation and knowledge sharing.

Conclusion: Isamu Shimoda's passion for innovation and his relentless pursuit of technological excellence continue to inspire the next generation of inventors and engineers worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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