Canon Kabushiki Kaisha

Isamu Shimoda

Masahiko Okunuki

Takeo Tsukamoto

Akira Suzuki

Akira Shimizu

Shunichi Uzawa

Masao Sugata

Tetsuya Kaneko

Toshihiko Takeda

Mamoru Miyawaki

Koji Uda

Kunitaka Ozawa

Nobutoshi Mizusawa

Takao Kariya

Takao Yonehara

Takeshi Ichikawa

Masanori Takenouchi

Kenji Nakamura

Shinichi Hara

Mitsuaki Amemiya

Eiji Sakamoto

Fumitaka Kan

Naoji Hayakawa

Masayuki A Suzuki

Yutaka Tanaka

Ryuichi Ebinuma

Kazuo Minoura

Eigo Kawakami

Shigeru Terashima

Makiko Mori

Mitsuaki Seki

Tetsuzo Mori

Osamu Hoshino

Naoto Abe

Shuzo Kaneko

Masahiko Enari

Noriyuki Nose

Tsutomu Toyono

Kazuo Isaka

Hiroshi Kurosawa

Yoshinobu Shiraiwa

Mitsuya Sato

Yuji Chiba

Mitsutoshi Kuno

Seishiro Yoshioka

Masaaki Kanashiki

Hitoshi Shindo

Hidehiko Fujioka

Masaaki Yoshida

Shinji Tsutsui

Mikiharu Matsuoka

Yasuko Miyazaki

An electron emission device comprises an electron emission electrode with a pointed end and a counter electrode positioned opposite to the pointed end, both formed by fine working of a conductive layer laminated on an insulating substrate.

Electron emission device with gap between electron emission electrode and substrate

An electron emitting device is provided with an N type semiconductor disposed in contact with a first electrode. A P type semiconductor contacts the N type semiconductor to define a PN junction. A low work function metal electrode contacts the P type semiconductor thus defining a Schottky barrier. First and second means are provided to forward bias the PN junction and to reversed bias the Schottky barrier, respectively.

Electron emitting element

Electron emission device with gap between electron emission electrode

A communication apparatus for a handicapped person, includes a plurality of first key switches for inputting character input data in a general input mode, a single second key switch for inputting character input data in a second key input mode, a character input device for inputting the character input data in the general input mode inputted by operating the plurality of first key switches or in the single key input mode inputted by operating the single second key switch, a character output device for outputting at least character output data which corresponds to the character input data inputted by the character input device, a mode selector for selecting the character input data input in the general input mode by the character input device or the character input data input in the single key input mode by the character input device, and a controller for controlling the operation of the character input device, the character output device, and the input mode selector.

Communication apparatus including a plurality of light sources arranged

The invention relates to a document image processing apparatus in which a document image is lighted by a lighting device and is photographed and the photographed document image is displayed on a display, wherein the apparatus has a memory comprising a volatile memory device or/and a non-volatile memory device and a controller having control means which includes an operational device therein and can intermittently light on/off the lighting device, thereby enabling the document image to be stored and reproduced. The display is constructed by a non-thermion device such as liquid crystal or the like and the controller has means to intermittently light on/off a light source of the lighting device, so that an electric power consumption can be reduced and a portability is improved.

Character image processing apparatus

An electron emitting device causes electron emission by a current supply in a coarse resistor film. The coarse thin resistor film is composed at least of a coarse thin silicon film.

Electron emitting device and process for producing the same

A scanning optical apparatus comprises a light source unit, scanning means for deflecting a beam from said light source unit and scanning a scanning surface with the beam, means for detecting the beam scanned on said scanning surface and control means for controlling the beam scanned on said scanning surface in a direction perpendicular to said scanning surface on the basis of a magnitude and a change as a function of time of a signal output from said detecting means.

Scanning optical apparatus having beam scan controller

A method of exposing a wafer to exposure energy such as ultraviolet rays or X-rays through a mask to transfer a pattern of the mask onto the wafer, for example. The temperature of the mask and/or the wafer increases during the exposure operation by absorption of the exposure energy. While the wafer is being exposed, the temperature of the mask and/or the wafer is detected. If the temperature is going to exceed an exposable temperature range determined on the basis of the line width of the pattern to be transferred, the exposure operation is interrupted. Then, the heat accumulated in the mask and/or the wafer is removed. Thereafter, the exposure operation is resumed. This is repeated until the predetermined or required amount of exposure is reached, for one shot. By this, thermal expansion of the mask and the wafer during the exposure operation is prevented to assure the precision of the pattern transfer.

Exposure method

An information processing apparatus for physically-handicapped users includes a keyboard for inputting visual display information adapted be the visually perceived, a first display for displaying the visual information in a form so as to be visually perceived, a converter for converting the visual display information into sounds which can be understood by a visually-impaired user or into tactile display information adapted to be perceived by a hearing impaired user, and a second display for outputting the information converted by the converter as a sound or a vibration.

Information processing apparatus

In a method for transferring information in a form of electron beam, an electron beam detector detects the electron beam, and emission of the electron beam from a predetermined electron beam source is controlled in accordance with a signal from the detector upon detection of the electron beam. A deflection electrode is also used to deflect the electron beams according to an electric or magnetic field to perform charge shifting, logical additions, logical multiplications, image formation, and the like.

Method and apparatus for transferring information by utilizing electron

Method for transferring information, and in particular for performing a

Electron emitting device having a polycrystalline silicon resistor

A method of manufacturing of semiconductor devices, includes exposing different portions of a semiconductor substrate with a first exposure apparatus having a first exposure range; placing and aligning the semiconductor substrate with respect to a second exposure range of a second exposure apparatus, which range is larger than the first exposure range of the first exposure apparatus; detecting an alignment error of each of the portions of the semiconductor substrate as covered by the second exposure range of the second exposure apparatus; calculating an overall alignment error of those portions of the semiconductor substrate with respect to the entire second exposure range of the second exposure apparatus, on the basis of the detected alignment errors; and controlling the exposure operation of the second exposure apparatus on the basis of the calculated overall alignment error.

A position detecting apparatus usable for aligning mask and a semiconductor wafer, wherein a laser beam produced by a semiconductor laser is projected through a predetermined optical system to alignment marks formed on the mask and the wafer, and the light reflected by the marks are detected by an accumulation type sensor to produce an electrical signal, from which the relative positional relation between the mask and the wafer are detected on the basis of the electrical signal. To obtain proper mark signals, the quantity of light incident on the accumulation sensor is controlled. In this apparatus, the beam emitting strength of the semiconductor laser is made constant, and the control of thee amount of light incident on the accumulation sensor is effected by controlling the operation period of the semiconductor laser. In addition, the actuation timing of the semiconductor laser is advanced from the accumulation start of the accumulation type sensor by the time required for the semiconductor laser to be thermally stabilized after its actuation. The mark detection signal produced by the accumulation sensor is precise.

Light quantity controlling apparatus

An exposure apparatus for exposing a semiconductor wafer to a semiconductor device pattern formed in a mask. The exposure energy is, for example, X-rays contains in synchrotron orbit radiation. A blade for limiting the area irradiated with the exposure energy on a mask or wafer is integrally movable in an alignment detecting unit for detecting the alignment mark. Four of such blades are provided to provide a square exposure area. The blades are movable independently by the associated alignment detecting units. Each of the blades is finely movable relative to the associated alignment detecting unit. The shape or size or the like of the blade is determined in consideration of the position of the blade in the direction of the exposure energy irradiation, and the maximum and minimum exposure view angle. The blade is cooled. The exposure area can be changed highly accurately and efficiently with a simple structure.

Exposure apparatus

Growing community of inventors

Zama, Japan

Isamu Shimoda