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For the Inventor, By the Inventor

Yokohama, Japan

Isamu Shimizu

This inventor holds 86 USPTO granted patents, primarily in Thin Film Technology (CPC class 427255). Top assignees: Canon Kabushiki Kaisha, Fuji Photo Film Company, Limited, Kanegafuchi Chemical Industry Co., Ltd.. Active years: 1981-1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Isamu Shimizu. Retrieved from https://idiyas.com/inventor/isamu-shimizu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 86

% Patents Active = 100.0

Average Co-Inventor Count = 3.4

ph-index = 22

Forward Citations = 1,788(Granted Patents)

Forward Citations (Not Self Cited) = 1,673(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Kanagawa, JP (1984 - 1989)
  • Tokyo, JP (1989)
  • Yokohama, JP (1981 - 1999)

Company Filing History:

goldMedal80 out of 92,901 
 
Canon Kabushiki Kaisha
 patents
silverMedal3 out of 16,458 
 
Fuji Photo Film Company, Limited
 patents
bronzeMedal3 out of 109 
 
Kanegafuchi Chemical Industry Co., Ltd.
 patents
4. 1 out of 1,344 
 
Mita Industrial Co., Ltd.
 patents
where one patent can have more than one assignee

Years Active: 1981-1999

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Areas of Expertise:
Thin Film
Deposition
Crystalline Semiconductor
Silicon Film
Photosensor
Photovoltaic Element
Electrophotography
Multilayer Structure
Functional Films
Transistor
Tin Oxide
Metal Film
86 patents (USPTO):Explore Patents
1. 5910342 - Process for forming deposition film (1999-06-08),
2. 5718761 - Method of forming crystalline compound semiconductor film (1998-02-17),
3. 5645947 - Silicon-containing deposited film (1997-07-08),
4. 5482557 - Device for forming deposited film (1996-01-09),
5. 5470389 - Apparatus for forming deposited film (1995-11-28),
6. 5391232 - Device for forming a deposited film (1995-02-21),
7. 5366554 - Device for forming a deposited film (1994-11-22),
8. 5322568 - Apparatus for forming deposited film (1994-06-21),
9. 5294285 - Process for the production of functional crystalline film (1994-03-15),
10. 5246886 - Process for depositing a silicon-containing polycrystalline film on a (1993-09-21),
11. 5244698 - Process for forming deposited film (1993-09-14),
12. 5178904 - Process for forming deposited film from a group II through group VI (1993-01-12),
13. 5160543 - Device for forming a deposited film (1992-11-03),
14. 5019887 - Non-single crystalline photosensor with hydrogen and halogen (1991-05-28),
15. 4946514 - Thin film photoelectromotive force element having multi-thin films (1990-08-07),

Title: The Innovative Legacy of Isamu Shimizu

Introduction:

Isamu Shimizu, a pioneering inventor hailing from Yokohama, JP, has left an indelible mark on the world of innovation with his groundbreaking contributions.

Latest Patents:

Among his 86 patents, Isamu Shimizu's recent inventions include a "Process for forming deposition film" and a "Method of forming crystalline compound semiconductor film." These patents highlight his prowess in developing advanced technologies that have the potential to revolutionize various industries.

Career Highlights:

With a rich professional background, Isamu Shimizu has lent his expertise to renowned companies such as Canon Kabushiki Kaisha and Fuji Photo Film Company, Limited. His innovative spirit and technical acumen have been instrumental in driving the companies towards success.

Collaborations:

Throughout his career, Isamu Shimizu has collaborated closely with esteemed colleagues such as Shunichi Ishihara and Masaaki Hirooka. Together, they have worked tirelessly to bring cutting-edge solutions to fruition and push the boundaries of technological advancement.

Conclusion:

In conclusion, Isamu Shimizu stands as a beacon of innovation, inspiring the next generation of inventors to think boldly and create solutions that have a lasting impact on society. His dedication to pushing the limits of what is possible serves as a testament to the power of innovation in shaping a brighter future for all.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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