Inkyun Shin

Title: Inkyun Shin: Innovator in Charged-Particle Beam Technologies

Introduction

Inkyun Shin is a prominent inventor based in Yongin-si, South Korea. He has made significant contributions to the field of charged-particle beam technologies, holding a total of 6 patents. His work focuses on advancing methods that enhance the precision and efficiency of electron beam lithography.

Latest Patents

Inkyun Shin's latest patents include innovative methods for charged-particle beam exposure and correction. The charged-particle beam exposure method involves providing a sample with patterns that have varying shot densities. This method allows for the acquisition of pattern drift values correlated with these densities, enabling precise irradiation of the sample with a charged-particle beam. The process is enhanced by correcting the deflection voltage applied to the beam based on the pattern drift values. Another notable patent is the electron beam lithography method and apparatus. This method includes obtaining a target pattern with a specified width and creating a dose pattern that incorporates both fixed and variable dose cells. The electron beam is then used to expose the substrate according to this carefully designed dose pattern.

Career Highlights

Inkyun Shin is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of technology in his field. His work has been instrumental in developing advanced lithography techniques that are crucial for modern electronics manufacturing.

Collaborations

Inkyun Shin collaborates with talented colleagues such as Jin Hyeock Choi and Sukjong Bae. Their combined expertise contributes to the innovative projects at Samsung Electronics Co., Ltd.

Conclusion

Inkyun Shin's contributions to charged-particle beam technologies exemplify the spirit of innovation in the electronics industry. His patents reflect a commitment to enhancing precision in lithography, which is vital for the advancement of modern technology.