The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 2016
Filed:
Jun. 30, 2014
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, KR;
Inventors:
Jin Choi, Yongin-si, KR;
Sukjong Bae, Seoul, KR;
Inkyun Shin, Yongin-si, KR;
Jeonghyeon Lee, Incheon, KR;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/50 (2012.01); G03F 1/68 (2012.01); G03F 1/72 (2012.01); G03F 1/00 (2012.01);
U.S. Cl.
CPC ...
G03F 1/72 (2013.01); G03F 1/00 (2013.01); G03F 1/50 (2013.01); G03F 1/68 (2013.01);
Abstract
Methods of reducing registration errors of photomasks and photomasks formed using the methods are provided. The method may include forming a plurality of photomask patterns on a substrate and determining registration errors of the plurality of photomask patterns. The method may further include forming a plurality of stress-producing portions in the substrate to reduce the registration errors by considering exposure latitude variations.