Ingo Meusel

Title: Ingo Meusel: Innovator in Semiconductor Manufacturing

Introduction

Ingo Meusel is a prominent inventor based in Dresden, Germany. He has made significant contributions to the field of semiconductor manufacturing, holding 2 patents that showcase his innovative methods and techniques.

Latest Patents

One of his latest patents is titled "Methods for manufacturing semiconductor devices." This patent describes a method for forming a semiconductor device that involves providing a semiconductor substrate with a plurality of semiconductor mesas. These mesas are spaced apart by sacrificial layers that can be selectively etched. The process includes forming a support structure that mechanically connects the semiconductor mesas while replacing the sacrificial layers. Another notable patent is "Method for manufacturing a semiconductor device," which outlines a method for producing a semiconductor device by forming semiconductor mesas in a substrate and connecting them with a support structure.

Career Highlights

Ingo Meusel is currently employed at Infineon Technologies Dresden GmbH, where he continues to advance semiconductor technology. His work has been instrumental in developing efficient manufacturing processes that enhance the performance and reliability of semiconductor devices.

Collaborations

Throughout his career, Ingo has collaborated with notable colleagues such as Kurt Sorschag and Daniel Sarlette. These partnerships have fostered innovation and contributed to the success of various projects within the semiconductor industry.

Conclusion

Ingo Meusel's contributions to semiconductor manufacturing reflect his dedication to innovation and excellence. His patents and work at Infineon Technologies Dresden GmbH highlight his role as a key player in advancing technology in this critical field.