Company Filing History:
Years Active: 2026
Title: Imola Zigoneanu: Innovator in Integrated Circuit Structures
Introduction
Imola Zigoneanu is a notable inventor based in Portland, OR (US). He has made significant contributions to the field of integrated circuit structures, particularly with his innovative patent that focuses on low resistivity source or drain structures.
Latest Patents
Zigoneanu holds a patent for "SiGe:GAB source or drain structures with low resistivity." This patent describes integrated circuit structures that include a fin with a lower and upper fin portion. The gate stack is positioned over the upper fin portion, featuring a first side opposite a second side. The first source or drain structure consists of an epitaxial structure embedded in the fin at the first side of the gate stack, while the second source or drain structure includes an epitaxial structure embedded in the fin at the second side. Each epitaxial structure comprises silicon, germanium, gallium, and boron, with both structures exhibiting a resistivity of less than 2E-9 Ohm cm.
Career Highlights
Zigoneanu is currently employed at Intel Corporation, where he continues to push the boundaries of technology through his research and development efforts. His work has been instrumental in advancing the performance and efficiency of integrated circuits.
Collaborations
Imola collaborates with various professionals in the field, including his coworker Debaleena Nandi, who brings her expertise to their joint projects.
Conclusion
Imola Zigoneanu's contributions to integrated circuit technology highlight his innovative spirit and dedication to advancing the field. His patent on low resistivity source and drain structures exemplifies the cutting-edge work being done at Intel Corporation.