Intel Corporation

Imola Zigoneanu

Tahir Ghani

Anand S Murthy

Mauro J Kobrinsky

Harold W Kennel

Chi-hing Choi

Anant H Jahagirdar

Debaleena Nandi

Pratik Patel

Integrated circuit structures having source or drain structures with low resistivity are described. In an example, integrated circuit structure includes a fin having a lower fin portion and an upper fin portion. A gate stack is over the upper fin portion of the fin, the gate stack having a first side opposite a second side. A first source or drain structure includes an epitaxial structure embedded in the fin at the first side of the gate stack. A second source or drain structure includes an epitaxial structure embedded in the fin at the second side of the gate stack. Each epitaxial structure of the first and second source or drain structures include silicon, germanium, gallium and boron. The first and second source or drain structures have a resistivity less than 2E-9 Ohm cm.

SiGe:GAB source or drain structures with low resistivity

Growing community of inventors

Portland, OR, United States of America

Imola Zigoneanu