Company Filing History:
Years Active: 2008-2023
Title: Ilona Rolfes: Innovator in Plasma Measurement Technology
Introduction
Ilona Rolfes is a distinguished inventor based in Bochum, Germany. She has made significant contributions to the field of plasma measurement technology, holding three patents that showcase her innovative spirit and technical expertise. Her work focuses on developing advanced devices for measuring plasma parameters, which are crucial in various scientific and industrial applications.
Latest Patents
One of her latest patents is a probe for measuring plasma parameters using active plasma resonance spectroscopy. This probe features an external coupling, a balun, an internal coupling, and a probe head, all integrated into an electrically-insulating substrate cylinder. The layered structure of the substrate cylinder allows for improved measurement of plasma parameters while minimizing the influence on the plasma during the measurement process.
Another notable invention is a device and method for measuring the density, electron temperature, and collision frequency of plasma. This device determines the density of plasma by analyzing the impulse response to a high-frequency signal coupled into the plasma. The design includes a probe head and a probe shaft, which can be introduced into the plasma, allowing for precise measurements.
Career Highlights
Ilona Rolfes has worked with reputable institutions, including Ruhr-Universität Bochum and Krohne S.A. Her experience in these organizations has contributed to her development as an inventor and researcher in the field of plasma technology.
Collaborations
Throughout her career, Ilona has collaborated with notable colleagues, including Thomas Musch and Christian Schulz. These partnerships have fostered innovation and advancement in her research endeavors.
Conclusion
Ilona Rolfes is a pioneering inventor whose work in plasma measurement technology has made a significant impact in her field. Her patents reflect her commitment to advancing scientific understanding and technological capabilities.
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