This inventor holds 1 USPTO granted patent. Top assignee: Tel Epion Corporation. Active years: 2016.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2016
Title: Il-seok Song: Innovator in Gas Cluster Ion Beam Technology
Introduction
Il-seok Song is a prominent inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of substrate patterning through his innovative methods. His work is particularly focused on enhancing the precision and efficiency of manufacturing processes.
Latest Patents
Il-seok Song holds a patent for a "Sidewall spacer patterning method using gas cluster ion beam." This method describes a process for patterning a substrate that includes receiving a substrate with a patterned layer. The patterned layer defines a first mandrel pattern, and a first material layer of a first composition is conformally deposited over this pattern. The method involves partially removing the first material layer using a gas cluster ion beam etching process to expose the top surface of the mandrel pattern. This innovative approach allows for the selective removal of the mandrel pattern, leaving a second mandrel pattern that comprises the remaining portion of the first material layer on the sidewalls.
Career Highlights
Il-seok Song is associated with Tel Epion Corporation, where he continues to develop and refine his innovative techniques. His work has garnered attention for its potential applications in various industries, particularly in semiconductor manufacturing.
Collaborations
Il-seok collaborates with notable colleagues, including Soo Doo Chae and Youngdon Chang. Their combined expertise contributes to the advancement of technologies in their field.
Conclusion
Il-seok Song's contributions to gas cluster ion beam technology exemplify the innovative spirit of modern inventors. His patent and ongoing work at Tel Epion Corporation highlight the importance of precision in manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile