Gwangju, South Korea

Il Houng Park

This inventor holds 2 USPTO granted patents and 6 published patent applications. Top assignee: Jusung Engineering Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Il Houng Park. Retrieved from https://idiyas.com/inventor/il-houng-park

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 50.0

Average Co-Inventor Count = 9.0

ph-index = 1


Company Filing History:


Years Active: 2026

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2 patents (USPTO):Explore Patents

Title: Il Houng Park: Innovator in Thin Film Deposition Technology

Introduction

Il Houng Park is a notable inventor based in Gwangju, South Korea. He has made significant contributions to the field of thin film deposition technology. His innovative methods have the potential to enhance various applications in electronics and materials science.

Latest Patents

Il Houng Park holds a patent for a thin film deposition method. This method involves depositing a thin film on a substrate through a unique process. It includes supplying a source gas along with a first diffusion gas onto the substrate, while simultaneously providing a reactant gas with a second diffusion gas. The gases are introduced through separate paths, ensuring an efficient deposition process. He has 1 patent to his name.

Career Highlights

Park is associated with Jusung Engineering Co., Ltd., a company known for its advancements in semiconductor manufacturing equipment. His work at the company has positioned him as a key player in the development of innovative technologies in the industry.

Collaborations

He has collaborated with notable colleagues, including Jun Seok Lee and Byung Gwan Lim. Their teamwork has contributed to the success of various projects within the company.

Conclusion

Il Houng Park's contributions to thin film deposition technology exemplify the impact of innovative thinking in engineering. His work continues to influence advancements in the field, showcasing the importance of collaboration and creativity in driving technological progress.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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