The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2026
Filed:
Jun. 03, 2022
Jusung Engineering Co., Ltd., Gwangju-Si, KR;
Yong Hyun Kim, Gwangju-Si, KR;
Il Houng Park, Gwangju-Si, KR;
Chang Kyun Park, Gwangju-Si, KR;
Won Ju Oh, Gwangju-Si, KR;
Dong Hwan Lee, Gwangju-Si, KR;
Yong Hyun Lee, Gwangju-Si, KR;
Jun Seok Lee, Gwangju-Si, KR;
Byung Gwan Lim, Gwangju-Si, KR;
Chul Joo Hwang, Gwangju-Si, KR;
JUSUNG ENGINEERING CO., LTD., , KR;
Abstract
Provided is a method for depositing a thin film, which is performed to deposit a thin film on a substrate. A method for depositing a thin film includes supplying a source gas together with a first diffusion gas onto a substrate provided in a process space, and supplying a reactant gas together with a second diffusion gas onto the substrate to continuous with the supplying of the source gas. The first diffusion gas and source gas and the second diffusion gas and reactant gas are supplied onto the substrate through paths different from each other.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile