Byung Gwan Lim

Title: Byung Gwan Lim: Innovator in Chamber Cleaning Technology

Introduction

Byung Gwan Lim is a notable inventor based in Gwangju-si, South Korea. He has made significant contributions to the field of chamber cleaning technology, particularly in the context of thin film deposition processes. With a total of 2 patents to his name, Lim's work is recognized for its innovative approach to improving cleaning methods in industrial applications.

Latest Patents

Lim's latest patents include a chamber cleaning device and a chamber cleaning method. These inventions focus on an apparatus and method designed to clean a chamber that becomes contaminated during the deposition of thin films on substrates. The cleaning method involves supplying a chlorine (Cl)-containing gas and a hydrogen (H)-containing gas into the chamber. By activating and reacting these gases within the chamber, a reaction gas is generated, which is then used to effectively clean the chamber.

Career Highlights

Throughout his career, Byung Gwan Lim has been associated with Jusung Engineering Co., Ltd., a company known for its advancements in semiconductor manufacturing equipment. His work has contributed to the development of more efficient cleaning processes, which are essential for maintaining the quality of thin films in various applications.

Collaborations

Lim has collaborated with notable colleagues, including Dong Hwan Lee and Jae Ho Kim. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas within the field.

Conclusion

Byung Gwan Lim's contributions to chamber cleaning technology highlight his role as an influential inventor in the industry. His innovative patents and collaborative efforts continue to advance the field, ensuring cleaner and more efficient manufacturing processes.