The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 20, 2024

Filed:

Jul. 21, 2022
Applicant:

Jusung Engineering Co., Ltd., Gwangju-Si, KR;

Inventors:

Dong Hwan Lee, Gwangju-Si, KR;

Jae Ho Kim, Seoul, KR;

Hyun Il Kim, Gwangju-Si, KR;

Ho Jin Yun, Gwangju-Si, KR;

Jae Wan Lee, Gwangju-Si, KR;

Byung Gwan Lim, Gwangju-Si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); B08B 5/00 (2006.01); B08B 9/08 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4405 (2013.01); B08B 5/00 (2013.01); B08B 9/08 (2013.01); H01J 37/3244 (2013.01); H01J 37/32862 (2013.01); B08B 2205/00 (2013.01); H01J 2237/334 (2013.01);
Abstract

The present disclosure relates to an apparatus and method for cleaning a chamber, and more particularly, to an apparatus and method for cleaning a chamber, which are capable of cleaning the chamber which is contaminated while depositing a thin film on a substrate. The chamber cleaning method in accordance with an exemplary embodiment is a method for cleaning a chamber configured to deposit a zinc oxide, the method comprising: supplying a chlorine (Cl)-containing gas and a hydrogen (H)-containing gas into a chamber; activating and reacting the separately supplied gases with each other inside the chamber to generate a reaction gas; and firstly cleaning the chamber with the reaction gas.


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