Dong Hwan Lee

Title: Innovations by Dong Hwan Lee

Introduction

Dong Hwan Lee is a notable inventor based in Gwangju-si, South Korea. He has made significant contributions to the field of chamber cleaning technology, particularly in the context of thin film deposition processes. With a total of 2 patents to his name, Lee's work is recognized for its innovative approach to improving cleaning methods in industrial applications.

Latest Patents

Lee's latest patents include a chamber cleaning device and a chamber cleaning method. These inventions focus on an apparatus and method designed to clean a chamber that becomes contaminated during the deposition of thin films on substrates. The cleaning method involves supplying a chlorine (Cl)-containing gas and a hydrogen (H)-containing gas into the chamber. These gases are activated and reacted with each other inside the chamber to generate a reaction gas, which is then used to clean the chamber effectively.

Career Highlights

Dong Hwan Lee is currently associated with Jusung Engineering Co., Ltd., where he continues to develop innovative solutions in the field of engineering. His expertise in chamber cleaning technology has positioned him as a valuable asset to his company and the industry at large.

Collaborations

Lee has collaborated with notable colleagues, including Jae Ho Kim and Hyun Il Kim, to advance the research and development of cleaning technologies. Their combined efforts have contributed to the successful implementation of innovative cleaning methods in various applications.

Conclusion

Dong Hwan Lee's contributions to chamber cleaning technology exemplify the importance of innovation in industrial processes. His patents reflect a commitment to enhancing the efficiency and effectiveness of cleaning methods, which is crucial for the advancement of thin film deposition technologies.