Gwangju-si, South Korea

Chang Kyun Park

USPTO Granted Patents = 4 

Average Co-Inventor Count = 6.6

ph-index = 1


Company Filing History:


Years Active: 2020-2025

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4 patents (USPTO):Explore Patents

Title: Chang Kyun Park: Innovator in Substrate Processing Technology

Introduction

Chang Kyun Park is a notable inventor based in Gwangju-si, South Korea. He has made significant contributions to the field of substrate processing, holding a total of 4 patents. His work focuses on improving the efficiency and effectiveness of substrate processing apparatuses.

Latest Patents

One of his latest patents is a method for cleaning the chamber of a substrate processing apparatus. This innovative cleaning method includes a chamber stabilizing process that transports a substrate out of the chamber while processing its interior. The process involves injecting a cleaning gas to etch and clean byproducts generated during thin film deposition. Additionally, it includes a coating process that injects a gas containing aluminum (Al), zirconium (Zr), or hafnium (Hf) to create a protective film on the chamber's inner wall and components.

Another significant patent is for a substrate processing apparatus that adjusts the positions of the first and second electrodes. This adjustment is made to account for differences in coefficients of thermal expansion, preventing short circuits that could occur due to thermal expansion during processing. This innovation ensures that the uniformity of the thin film is maintained, even when processing large substrates.

Career Highlights

Chang Kyun Park is currently employed at Jusung Engineering Co., Ltd., where he continues to develop advanced technologies in substrate processing. His expertise in this area has positioned him as a key figure in the industry.

Collaborations

He has collaborated with notable coworkers, including Yong Hyun Kim and Jae Wan Lee, contributing to various projects that enhance substrate processing technologies.

Conclusion

Chang Kyun Park's innovative work in substrate processing technology has led to significant advancements in the field. His patents reflect a commitment to improving the efficiency and reliability of substrate processing apparatuses.

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