The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2025
Filed:
Jun. 11, 2020
Jusung Engineering Co., Ltd., Gwangju-si, KR;
Jae Wan Lee, Gwangju-si, KR;
Yong Hyun Kim, Gwangju-si, KR;
Yoon Jeong Kim, Gwangju-si, KR;
Yun Hoe Kim, Gwangju-si, KR;
Chang Kyun Park, Gwangju-si, KR;
Gu Hyun Jung, Gwangju-si, KR;
Ki Bum Kim, Gwangju-si, KR;
Seung Youb Sa, Gwangju-si, KR;
Chul Joo Hwang, Gwangju-si, KR;
JUSUNG ENGINEERING CO., LTD., , KR;
Abstract
Provided is a substrate processing apparatus. The positions of a first electrode and a second electrode are adjusted in advance in consideration of differences in coefficients of thermal expansion so that a short circuit created by contact between the first electrode and the second electrode is prevented even in the case in which the first electrode and the second electrode are thermally expanded during processing. Even in the case in which the first electrode and the second electrode are thermally expanded due to an increase in temperature during processing, a short circuit between the first electrode and the second electrode can be prevented, and the uniformity of a thin film can be maintained in the substrate processing apparatus for processing a large substrate.