Iksu Byun

Title: Iksu Byun: Innovator in Plasma Processing Technology

Introduction

Iksu Byun is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of semiconductor manufacturing, particularly in plasma processing technology. With a total of 2 patents to his name, Byun continues to push the boundaries of innovation in his industry.

Latest Patents

Iksu Byun's latest patents include a plasma processing apparatus and a semiconductor device manufacturing method using the same. The plasma processing apparatus features an electrostatic chuck that supports a wafer and is connected to a first power supply. It also includes an edge ring made of a material with a specific resistivity value, a dielectric ring that supports the edge ring, and an electrode ring that overlaps the dielectric ring. The resistivity values of these components are carefully designed to optimize performance. Additionally, Byun has developed a method of etching at low temperatures, which involves cooling a pedestal, generating plasma from a gas, and injecting a heated inert gas into the chamber.

Career Highlights

Iksu Byun is currently employed at Samsung Electronics Co., Ltd., where he applies his expertise in semiconductor technology. His work has been instrumental in advancing the efficiency and effectiveness of plasma processing methods used in the manufacturing of semiconductor devices.

Collaborations

Throughout his career, Byun has collaborated with talented individuals such as Cheonkyu Lee and Moonseok Kim. These collaborations have fostered an environment of innovation and have contributed to the successful development of new technologies in the semiconductor field.

Conclusion

Iksu Byun is a prominent figure in the realm of plasma processing technology, with a focus on enhancing semiconductor manufacturing methods. His innovative patents and contributions to Samsung Electronics Co., Ltd. highlight his commitment to advancing the industry.