Ikko Tanaka

Title: Ikko Tanaka: Innovator in Plasma Processing Technology

Introduction

Ikko Tanaka is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of plasma processing, holding a total of 5 patents. His work focuses on innovative methods and apparatuses that enhance the efficiency and effectiveness of plasma processing technologies.

Latest Patents

Tanaka's latest patents include a plasma processing method and a plasma processing apparatus. The plasma processing method involves placing a substrate onto a support surface within a chamber and etching a film on the substrate using plasma. Additionally, it includes a cleaning process for the chamber with plasma. A unique aspect of this method is the application of a bias voltage, which includes a pulse of direct current voltage, to a bias electrode in the substrate support. The bias frequency is adjusted to be higher during the cleaning process compared to the etching process.

Another notable patent is a method for determining the amount of wear of an edge ring in a plasma processing apparatus. This method involves generating plasma in a chamber and cyclically applying voltage to draw ions from the plasma to the substrate support. The wear of the edge ring is determined based on voltage measurements from the electrodes during the application of the voltage pulse.

Career Highlights

Ikko Tanaka is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work at the company has allowed him to develop and refine his innovative plasma processing technologies.

Collaborations

Throughout his career, Tanaka has collaborated with notable colleagues, including Hiroshi Tsujimoto and Lifu Li. These collaborations have contributed to the advancement of plasma processing techniques and have fostered a productive research environment.

Conclusion

Ikko Tanaka's contributions to plasma processing technology have established him as a key figure in the field. His innovative patents and collaborative efforts continue to influence advancements in semiconductor manufacturing.