This inventor holds 2 USPTO granted patents. Top assignee: Micronic Laser Systems Ab. Active years: 2010-2011.
Company Filing History:
Years Active: 2010-2011
Title: Igor Ivonin: Innovator in Lithography and Imaging Systems
Introduction
Igor Ivonin is a notable inventor based in Gothenburg, Sweden. He has made significant contributions to the fields of lithography and imaging systems, holding a total of 2 patents. His work focuses on enhancing the efficiency and effectiveness of optical systems used in various applications.
Latest Patents
Igor's latest patents include groundbreaking innovations. The first patent, titled "SLM lithography: printing to below K1=.30 without previous OPC processing," extends previously disclosed methods and devices. This application introduces a two-dimensional analysis of optical proximity interactions and a computationally efficient kernel for rapid calculation of necessary adjustments. The computations can be performed in real-time, significantly reducing the need for OPC assist features, leading to substantial savings in file size and computational requirements.
The second patent, "Pupil improvement of incoherent imaging systems for enhanced CD linearity," describes a pattern generator that includes an electromagnetic radiation source and an optical system. The electromagnetic radiation source emits radiation to create a pattern on a workpiece. The optical system is designed to optimize critical dimension linearity for the created pattern through effective apodization of the electromagnetic radiation.
Career Highlights
Igor Ivonin is currently associated with Micronic Laser Systems AB, where he continues to innovate and develop advanced technologies. His expertise in lithography and imaging systems has positioned him as a key player in the industry.
Collaborations
Igor has collaborated with several professionals in his field, including Torbjörn Sandström and Torbjorn E Sandstrom. These collaborations have further enhanced his research and development efforts.
Conclusion
Igor Ivonin's contributions to lithography and imaging systems demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of optical systems and their applications, making him a valuable asset in the field of technology.