The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 27, 2010
Filed:
Aug. 23, 2005
Torbjorn Sandstrom, Pixbo, SE;
Igor Ivonin, Gothenburg, SE;
Torbjorn Sandstrom, Pixbo, SE;
Igor Ivonin, Gothenburg, SE;
Micronic Laser Systems AB, Taby, SE;
Abstract
A pattern generator may include an electromagnetic radiation source and an optical system. The electromagnetic radiation source may emit electromagnetic radiation to create a pattern on a workpiece. The optical system may include an optical path for the electromagnetic radiation emitted from the electromagnetic radiation source and may be configured such that an apodization of the electromagnetic radiation is sufficient to optimize a critical dimension linearity for the created pattern.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile